TY - GEN
T1 - Overview on the design of low-leakage power-rail ESD clamp circuits in nanoscale CMOS processes
AU - Altolaguirre, Federico A.
AU - Ker, Ming-Dou
PY - 2011/10/5
Y1 - 2011/10/5
N2 - The circuit techniques to overcome the gate leakage issue in advanced nanoscale CMOS technologies are presented. These circuit techniques can reduce the total leakage current from the high value of 21μA in the traditional power-rail ESD clamp circuit down to only 96nA (under 1 Volt operating voltage, at room temperature) while maintaining very high ESD robustness (as high as 8kV HBM and 800V MM) in a 65-nm CMOS technology.
AB - The circuit techniques to overcome the gate leakage issue in advanced nanoscale CMOS technologies are presented. These circuit techniques can reduce the total leakage current from the high value of 21μA in the traditional power-rail ESD clamp circuit down to only 96nA (under 1 Volt operating voltage, at room temperature) while maintaining very high ESD robustness (as high as 8kV HBM and 800V MM) in a 65-nm CMOS technology.
UR - http://www.scopus.com/inward/record.url?scp=80053375867&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:80053375867
SN - 9789871620463
T3 - 2011 Argentine School of Micro-Nanoelectronics, Technology and Applications, EAMTA 2011
SP - 108
EP - 112
BT - 2011 Argentine School of Micro-Nanoelectronics, Technology and Applications, EAMTA 2011
T2 - 2011 Argentine School of Micro-Nanoelectronics, Technology and Applications, EAMTA 2011
Y2 - 6 August 2011 through 13 August 2011
ER -