Organometallic vapor phase epitaxy growth and optical characteristics of almost 1.2 μm GalnNAs three-quantum-well laser diodes

N. Y. Li*, C. P. Hains, K. Yang, J. Lu, J. Cheng, Pei-Wen Li

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

30 Scopus citations

Abstract

We report organometallic vapor-phase epitaxy (OMVPE) growth and optical characteristics of 1.17-1.20 μm double-heterostructure laser diodes with three Ga 0.7 In 0.3 N 0.003 As 0.997 (7 nm)/GaAs(10 nm) quantum wells (GaInNAs/GaAs QWs). Three GaInNAs/GaAs QWs were successfully grown by OMVPE using dimethylhydrazine as the N precursor. Strong room-temperature photoluminescence at the 1.17-1.19 μm regime with a full width at half maximum of 33 meV has been routinely achieved. By using three GaInNAs/GaAs QWs as the gain medium of the GaInNAs laser, room temperature operation with a threshold current density of 1.2kA/cm 2 has been successfully demonstrated.

Original languageEnglish
Pages (from-to)1051-1053
Number of pages3
JournalApplied Physics Letters
Volume75
Issue number8
DOIs
StatePublished - 23 Aug 1999

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