Optoelectronic and structural properties of good quality hydrogenated amorphous silicon carbide films deposited by hot wire assisted RF plasma deposition technique

S. Chattopadhyay*, Debabrata Das, A. K. Barua, D. L. Williamson, S. T. Kshirsagar

*Corresponding author for this work

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6 Scopus citations

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Engineering

Physics

Material Science