Optimum conditions for thermal fixing of volume holograms in Fe:LiNbO3

Shiuan-Huei Lin*, C. R. Hsieh, T. C. Hsieh, Ken-Yuh Hsu, Arthur E.T. Chiou

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review


The kinetics of the recording, compensating, and developing processes in two typical thermal fixing procedures (L-H-L and H-L procedures) are analyzed. The optimum condition (in terms of the fixing temperature, compensation time and material parameters) for each fixing procedures are obtained under the boundary condition of short-circuit. Experimental results are shown which are in qualitative agreement with the theory in L-H-L procedure.

Original languageEnglish
Pages (from-to)83-90
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
StatePublished - 1 Dec 1999
EventProceedings of the 1999 Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications V - Denver, CO, USA
Duration: 18 Jul 199919 Jul 1999


Dive into the research topics of 'Optimum conditions for thermal fixing of volume holograms in Fe:LiNbO3'. Together they form a unique fingerprint.

Cite this