Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering

V. N. Kruchinin; T. V. Perevalov; V. V. Atuchin; V. A. Gritsenko; A. I. Komonov; I. V. Korolkov; L. D. Pokrovsky; Cheng Wei Shih; Albert Chin

doi:10.1007/s11664-017-5552-3

Optical Properties of TiO₂ Films Deposited by Reactive Electron Beam Sputtering

V. N. Kruchinin, T. V. Perevalov, V. V. Atuchin^*, V. A. Gritsenko, A. I. Komonov, I. V. Korolkov, L. D. Pokrovsky, Cheng Wei Shih, Albert Chin

^*Corresponding author for this work

Institute of Electronics

Research output: Contribution to journal › Article › peer-review

43 Scopus citations

Abstract

Titanium dioxide (anatase, a-TiO₂) films have been prepared by electron beam sputtering of a TiO₂ target in reactive atmosphere and their structural, microstructural, and optical properties were evaluated by reflection high-energy electron diffraction (RHEED) and x-ray diffraction (XRD) analyses, atomic force microscopy (AFM), and spectroscopic ellipsometry (SE). Different reflection models for determination of film optical parameters were tested and compared. The dispersive optical parameters were defined using the Tauc–Lorentz model by SE in the photon energy range of E = 1.12–4.96 eV. The films were transparent at E < 3 eV, but noticeable absorption was detected at E > 3 eV. The bandgap was estimated at the level of E_g ≈ 3.44 eV.

Original language	English
Pages (from-to)	6089-6095
Number of pages	7
Journal	Journal of Electronic Materials
Volume	46
Issue number	10
DOIs	https://doi.org/10.1007/s11664-017-5552-3
State	Published - 1 Oct 2017

Keywords

AFM
RHEED
TiO
film
optical constant
spectroscopic ellipsometry

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@article{c4e7f884386846d481a96925acf21bb4,

title = "Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering",

abstract = "Titanium dioxide (anatase, a-TiO2) films have been prepared by electron beam sputtering of a TiO2 target in reactive atmosphere and their structural, microstructural, and optical properties were evaluated by reflection high-energy electron diffraction (RHEED) and x-ray diffraction (XRD) analyses, atomic force microscopy (AFM), and spectroscopic ellipsometry (SE). Different reflection models for determination of film optical parameters were tested and compared. The dispersive optical parameters were defined using the Tauc–Lorentz model by SE in the photon energy range of E = 1.12–4.96 eV. The films were transparent at E < 3 eV, but noticeable absorption was detected at E > 3 eV. The bandgap was estimated at the level of Eg ≈ 3.44 eV.",

keywords = "AFM, RHEED, TiO, film, optical constant, spectroscopic ellipsometry",

author = "Kruchinin, {V. N.} and Perevalov, {T. V.} and Atuchin, {V. V.} and Gritsenko, {V. A.} and Komonov, {A. I.} and Korolkov, {I. V.} and Pokrovsky, {L. D.} and Shih, {Cheng Wei} and Albert Chin",

note = "Publisher Copyright: {\textcopyright} 2017, The Minerals, Metals & Materials Society.",

year = "2017",

month = oct,

day = "1",

doi = "10.1007/s11664-017-5552-3",

language = "English",

volume = "46",

pages = "6089--6095",

journal = "Journal of Electronic Materials",

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publisher = "Springer New York",

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TY - JOUR

T1 - Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering

AU - Kruchinin, V. N.

AU - Perevalov, T. V.

AU - Atuchin, V. V.

AU - Gritsenko, V. A.

AU - Komonov, A. I.

AU - Korolkov, I. V.

AU - Pokrovsky, L. D.

AU - Shih, Cheng Wei

AU - Chin, Albert

PY - 2017/10/1

Y1 - 2017/10/1

N2 - Titanium dioxide (anatase, a-TiO2) films have been prepared by electron beam sputtering of a TiO2 target in reactive atmosphere and their structural, microstructural, and optical properties were evaluated by reflection high-energy electron diffraction (RHEED) and x-ray diffraction (XRD) analyses, atomic force microscopy (AFM), and spectroscopic ellipsometry (SE). Different reflection models for determination of film optical parameters were tested and compared. The dispersive optical parameters were defined using the Tauc–Lorentz model by SE in the photon energy range of E = 1.12–4.96 eV. The films were transparent at E < 3 eV, but noticeable absorption was detected at E > 3 eV. The bandgap was estimated at the level of Eg ≈ 3.44 eV.

AB - Titanium dioxide (anatase, a-TiO2) films have been prepared by electron beam sputtering of a TiO2 target in reactive atmosphere and their structural, microstructural, and optical properties were evaluated by reflection high-energy electron diffraction (RHEED) and x-ray diffraction (XRD) analyses, atomic force microscopy (AFM), and spectroscopic ellipsometry (SE). Different reflection models for determination of film optical parameters were tested and compared. The dispersive optical parameters were defined using the Tauc–Lorentz model by SE in the photon energy range of E = 1.12–4.96 eV. The films were transparent at E < 3 eV, but noticeable absorption was detected at E > 3 eV. The bandgap was estimated at the level of Eg ≈ 3.44 eV.

KW - AFM

KW - RHEED

KW - TiO

KW - film

KW - optical constant

KW - spectroscopic ellipsometry

UR - http://www.scopus.com/inward/record.url?scp=85019218849&partnerID=8YFLogxK

U2 - 10.1007/s11664-017-5552-3

DO - 10.1007/s11664-017-5552-3

M3 - Article

AN - SCOPUS:85019218849

SN - 0361-5235

VL - 46

SP - 6089

EP - 6095

JO - Journal of Electronic Materials

JF - Journal of Electronic Materials

IS - 10

ER -

Optical Properties of TiO₂ Films Deposited by Reactive Electron Beam Sputtering

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Keywords

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