On-chip high-voltage charge pump circuit in standard CMOS processes with polysilicon diodes

Ming Dou Ker*, Shih Lun Chen

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    9 Scopus citations

    Abstract

    An on-chip high-voltage charge pump circuit realized with the polysillcon diodes in standard (bulk) CMOS process is presented in this paper. Because the polysilicon diodes are fully Isolated from the substrate, the output voltage of the charge pump circuit is not limited by the junction breakdown voltage of MOSFETs. The polysilicon diodes can be implemented in the standard CMOS processes without extra process steps. The proposed charge pump circuit has been fabricated in a 0.25-μm 2.5-V standard CMOS process. The output voltage of the 12-stage charge pump circuit can be pumped up to 28.08 V, which is much higher than the n-well/p-substrate breakdown voltage (18.9 V) in a 0.25-μm 2.5-V standard CMOS process.

    Original languageEnglish
    Title of host publication2005 IEEE Asian Solid-State Circuits Conference, ASSCC 2005
    PublisherIEEE Computer Society
    Pages157-160
    Number of pages4
    ISBN (Print)0780391624, 9780780391628
    DOIs
    StatePublished - 1 Jan 2005
    Event1st IEEE Asian Solid-State Circuits Conference, ASSCC 2005 - Hsinchu, Taiwan
    Duration: 1 Nov 20053 Nov 2005

    Publication series

    Name2005 IEEE Asian Solid-State Circuits Conference, ASSCC 2005

    Conference

    Conference1st IEEE Asian Solid-State Circuits Conference, ASSCC 2005
    Country/TerritoryTaiwan
    CityHsinchu
    Period1/11/053/11/05

    Fingerprint

    Dive into the research topics of 'On-chip high-voltage charge pump circuit in standard CMOS processes with polysilicon diodes'. Together they form a unique fingerprint.

    Cite this