Novel electrostatic discharge protection design for nanoelectronics in nanoscale CMOS technology

Ming-Dou Ker, Tang Kui Tseng

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    1 Scopus citations

    Abstract

    A novel electrostatic discharge (ESD) protection concept by using the already-on device is proposed to effectively protect CMOS integrated circuits (IC) in nanoscale CMOS processes against ESD stress. Such an already-on NMOS device is designed to have a threshold voltage of ∼0V, or even negative. When the IC is under the ESD zapping conditions, such already-on NMOS in CMOS IC are initially standing in the turn-on state and ready to discharge ESD current during any ESD zapping. So, such already-on NMOS has the fastest turn-on speed and the lowest trigger-on voltage to effectively protect the internal circuits with a much thinner gate oxide (∼15Å) in future sub-100 nm CMOS technology. To keep such already-on devices off when the IC is under normal circuit operating condition, an on-chip negative voltage generator realized by the diodes and capacitors is used to bias the gates of such already-on devices. The proposed already-on device and the on-chip negative voltage generator are fully process-compatible to the general sub-100 nm CMOS processes.

    Original languageEnglish
    Title of host publication2003 3rd IEEE Conference on Nanotechnology, IEEE-NANO 2003 - Proceedings
    PublisherIEEE Computer Society
    Pages737-740
    Number of pages4
    ISBN (Electronic)0780379764
    DOIs
    StatePublished - 1 Jan 2003
    Event2003 3rd IEEE Conference on Nanotechnology, IEEE-NANO 2003 - San Francisco, United States
    Duration: 12 Aug 200314 Aug 2003

    Publication series

    NameProceedings of the IEEE Conference on Nanotechnology
    Volume2
    ISSN (Print)1944-9399
    ISSN (Electronic)1944-9380

    Conference

    Conference2003 3rd IEEE Conference on Nanotechnology, IEEE-NANO 2003
    Country/TerritoryUnited States
    CitySan Francisco
    Period12/08/0314/08/03

    Keywords

    • CMOS integrated circuits
    • CMOS process
    • CMOS technology
    • Electrostatic discharge
    • Integrated circuit technology
    • MOS devices
    • Nanoelectronics
    • Nanoscale devices
    • Protection
    • Voltage

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