Novel Deep-blue Light Phase-only LCoS 1080p Panel for Maskless Holographic Etching Optical System

Wei Tien Chang; Jhou Pu Yang; Zheng Ning Xu; Huang Ming Philip Chen

doi:10.1002/SDTP.12059

Novel Deep-blue Light Phase-only LCoS 1080p Panel for Maskless Holographic Etching Optical System

Wei Tien Chang, Jhou Pu Yang, Zheng Ning Xu, Huang Ming Philip Chen

Department of Photonics

Research output: Contribution to journal › Conference article › peer-review

1 Scopus citations

Abstract

Arbitrary and reconfiguration pattern transfer photolithographic process using deep blue light source (405 nm) with off-axis phase-only beam shaping system is reported in this study. The LCoS panel uniformity error is below 1.41 % with 8 ms response time. Reconstructed diffraction images from CGH patterns were displayed on 8° off-axis screen/target plate. The linearly calibrated look-up table (LUT) showed better performance in suppressing the zero-order intensity. The ghost image was solved as well. The diffractive images generated from linear LUT can be applied in the maskless lithographic pattern. The periodic stripe pattern at 35 pm width with 2 pm thickness photoresistant film was demonstrated using the reported optical system.

Original language	English
Pages (from-to)	1873-1875
Number of pages	3
Journal	Digest of Technical Papers - SID International Symposium
Volume	48
Issue number	1
DOIs	https://doi.org/10.1002/SDTP.12059
State	Published - 2017
Event	SID Symposium, Seminar, and Exhibition 2017, Display Week 2017 - Los Angeles, United States Duration: 21 May 2017 → 26 May 2017

Keywords

Deep-blue light source
Diffraction Optical Elements
Liquid Crystal Technology
Photolithography
Spatial Light Modulation

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10.1002/SDTP.12059

Cite this

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title = "Novel Deep-blue Light Phase-only LCoS 1080p Panel for Maskless Holographic Etching Optical System",

abstract = "Arbitrary and reconfiguration pattern transfer photolithographic process using deep blue light source (405 nm) with off-axis phase-only beam shaping system is reported in this study. The LCoS panel uniformity error is below 1.41 % with 8 ms response time. Reconstructed diffraction images from CGH patterns were displayed on 8° off-axis screen/target plate. The linearly calibrated look-up table (LUT) showed better performance in suppressing the zero-order intensity. The ghost image was solved as well. The diffractive images generated from linear LUT can be applied in the maskless lithographic pattern. The periodic stripe pattern at 35 pm width with 2 pm thickness photoresistant film was demonstrated using the reported optical system.",

keywords = "Deep-blue light source, Diffraction Optical Elements, Liquid Crystal Technology, Photolithography, Spatial Light Modulation",

author = "Chang, {Wei Tien} and Yang, {Jhou Pu} and Xu, {Zheng Ning} and Chen, {Huang Ming Philip}",

note = "Publisher Copyright: {\textcopyright} 2017 SID.; SID Symposium, Seminar, and Exhibition 2017, Display Week 2017 ; Conference date: 21-05-2017 Through 26-05-2017",

year = "2017",

doi = "10.1002/SDTP.12059",

language = "English",

volume = "48",

pages = "1873--1875",

journal = "Digest of Technical Papers - SID International Symposium",

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publisher = "John Wiley and Sons Inc.",

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T1 - Novel Deep-blue Light Phase-only LCoS 1080p Panel for Maskless Holographic Etching Optical System

AU - Chang, Wei Tien

AU - Yang, Jhou Pu

AU - Xu, Zheng Ning

AU - Chen, Huang Ming Philip

PY - 2017

Y1 - 2017

N2 - Arbitrary and reconfiguration pattern transfer photolithographic process using deep blue light source (405 nm) with off-axis phase-only beam shaping system is reported in this study. The LCoS panel uniformity error is below 1.41 % with 8 ms response time. Reconstructed diffraction images from CGH patterns were displayed on 8° off-axis screen/target plate. The linearly calibrated look-up table (LUT) showed better performance in suppressing the zero-order intensity. The ghost image was solved as well. The diffractive images generated from linear LUT can be applied in the maskless lithographic pattern. The periodic stripe pattern at 35 pm width with 2 pm thickness photoresistant film was demonstrated using the reported optical system.

AB - Arbitrary and reconfiguration pattern transfer photolithographic process using deep blue light source (405 nm) with off-axis phase-only beam shaping system is reported in this study. The LCoS panel uniformity error is below 1.41 % with 8 ms response time. Reconstructed diffraction images from CGH patterns were displayed on 8° off-axis screen/target plate. The linearly calibrated look-up table (LUT) showed better performance in suppressing the zero-order intensity. The ghost image was solved as well. The diffractive images generated from linear LUT can be applied in the maskless lithographic pattern. The periodic stripe pattern at 35 pm width with 2 pm thickness photoresistant film was demonstrated using the reported optical system.

KW - Deep-blue light source

KW - Diffraction Optical Elements

KW - Liquid Crystal Technology

KW - Photolithography

KW - Spatial Light Modulation

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U2 - 10.1002/SDTP.12059

DO - 10.1002/SDTP.12059

M3 - Conference article

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JO - Digest of Technical Papers - SID International Symposium

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ER -

Novel Deep-blue Light Phase-only LCoS 1080p Panel for Maskless Holographic Etching Optical System

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Keywords

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