Abstract
We have prepared bulk p-AlInGaN layers and light-emitting diodes (LEDs) with p-AlInGaN surface layers by metal-organic chemical vapor deposition. By properly control the TMAI and TMIn flow rates, we could match the lattice constant of p-AlInGaN to that of GaN. It was found that surface of the LED with p-AlInGaN layer was rough with a high density of hexagonal pits. Although the forward voltage of the LED with p-AlInGaN layer was slightly larger, it was found that we can enhance the output power by 54% by using p-AlInGaN surface layer.
Original language | English |
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Pages (from-to) | 2346-2349 |
Number of pages | 4 |
Journal | IEEE Transactions on Electron Devices |
Volume | 52 |
Issue number | 10 |
DOIs | |
State | Published - 1 Oct 2005 |
Keywords
- InGaN/GaN
- Light-emitting diode (LED)
- P-AlInGaN, V-shap pits