Abstract
A novel native-NMOS-triggered SCR (NANSCR) is proposed for efficient ESD protection design in a 0.13-μm CMOS process. As compared with the traditional LVTSCR, the trigger voltage, turn-on resistance, turn-on speed, and COM ESD level of NANSCR have been greatly improved to protect the ultra-thin gate oxide against ESD stresses. The proposed NANSCR can be designed for the input, output, and power-rail ESD protection circuits without latchup danger in a 0.13-μm CMOS process with VDD of 1.2 V. A new whole-chip ESD protection scheme realized with the NANSCR devices has been also demonstrated with the consideration of pin-to-pin ESD zapping.
Original language | English |
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Article number | 1315356 |
Pages (from-to) | 381-386 |
Number of pages | 6 |
Journal | IEEE International Reliability Physics Symposium Proceedings |
Volume | 2004-January |
Issue number | January |
DOIs | |
State | Published - Apr 2004 |
Event | 2004 IEEE International Reliability Physics Symposium Proceedings, 42nd Annual - Phoenix, AZ., United States Duration: 25 Apr 2004 → 29 Apr 2004 |
Keywords
- CDM
- ESD
- ESD protection circuit
- HBM
- Latchup
- SCR