Abstract
This chapter describes how, in order to achieve high efficiency light-emitting diodes (LEDs) and enhance the crystal quality of the epitaxial layer, we investigated the following nanotechnologies to enhance our LED devices: SiO2-based nanorod-array patterned sapphire substrates (NAPSSs), native-grown GaN nanopillars (NPs) and etched nanopillars using embedded SiO2 nanomasks. Our studies showed these approaches can achieve high-quality nanocrystalline growth and robust fabrication to produce high-performance LEDs. These novel nanotechnologies could be effective for improving GaN-based optoelectronic device performance in the future.
Original language | English |
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Title of host publication | Nitride Semiconductor Light-Emitting Diodes (LEDs) |
Subtitle of host publication | Materials, Technologies and Applications |
Publisher | Elsevier Ltd |
Pages | 216-249 |
Number of pages | 34 |
ISBN (Print) | 9780857095077 |
DOIs | |
State | Published - 1 Dec 2013 |
Keywords
- Gallium nitride
- GaN
- Light-emitting diodes
- Nanotechnology