Nanosheet High Mobility SnO2-SnO Complementary TFTs for System-on-Display and Monolithic Three-Dimensional Integrated Circuit

Albert Chin, Te Jui Yen, Vladimir Gritsenko

Research output: Contribution to journalConference articlepeer-review

Abstract

The top-gate 4.5-nm-thick SnO2 nanosheet nTFT has the high 136 cm2/Vs field-effect mobility (uFE), sharp 1.5x108 on-current/ off-current (ION/IOFF), and fast turn-on subthreshold slope (SS) of 108 mV/decade. The top-gate 7-nm-thick nanosheet SnO pTFT has a high μFE of 4.4 cm2/Vs, large ION/IOFF of 1.2×105, and SS of 526 mV/decade. These CTFTs will enable the system-on-panel (SoP) and Monolithic Three-Dimensional (3D) Integrated Circuit (IC).

Original languageEnglish
Pages (from-to)393-395
Number of pages3
JournalDigest of Technical Papers - SID International Symposium
Volume53
Issue numberS1
DOIs
StatePublished - 2022
EventInternational Conference on Display Technology, ICDT 2022 - Fuzhou, China
Duration: 9 Jul 202212 Jul 2022

Keywords

  • complementary TFTs
  • high mobility
  • nanosheet transistor
  • SnO pTFT
  • SnO2 nTFT
  • three-dimensional integrated circuit

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