Nanoimprinting lithography as novel tool inducing self-aligned liquid crystals for alignment layer

Huang-Ming Chen; Chih Ho Chiu; Hui Lung Kuo; Pin G. Chen; Chun Hsiang Wen; Yi Chun Liu

doi:10.1889/1.2433209

Nanoimprinting lithography as novel tool inducing self-aligned liquid crystals for alignment layer

Huang-Ming Chen^*, Chih Ho Chiu, Hui Lung Kuo, Pin G. Chen, Chun Hsiang Wen, Yi Chun Liu

^*Corresponding author for this work

Department of Photonics

Research output: Contribution to journal › Conference article › peer-review

1 Scopus citations

Abstract

Polymerizable nematic liquid crystal (LC) was applied as resist for our newly developed nanoimprinting lithography process. The LC resist was self-aligned during imprinting process at very low impriting pressure, 1.5 bar and the patterned area was able to achieve 4×4 cm². The optical anisotropic was verified through polarized optical microscopy (POM). The various thickness of LC resist was evaluated and compared alignment ability with polyimide, and isotropic resists. The micro-grated LC films prepared by this novel method offer new applications for liquid crystal as alignment layer within LC cells as well as preparation of optical anisotropic films.

Original language	English
Pages (from-to)	1265-1267
Number of pages	3
Journal	Digest of Technical Papers - SID International Symposium
Volume	37
Issue number	1
DOIs	https://doi.org/10.1889/1.2433209
State	Published - 1 Dec 2006
Event	44th International Symposium, Seminar, and Exhibition, SID 2006 - San Francisco, CA, United States Duration: 4 Jun 2006 → 9 Jun 2006

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title = "Nanoimprinting lithography as novel tool inducing self-aligned liquid crystals for alignment layer",

abstract = "Polymerizable nematic liquid crystal (LC) was applied as resist for our newly developed nanoimprinting lithography process. The LC resist was self-aligned during imprinting process at very low impriting pressure, 1.5 bar and the patterned area was able to achieve 4×4 cm2. The optical anisotropic was verified through polarized optical microscopy (POM). The various thickness of LC resist was evaluated and compared alignment ability with polyimide, and isotropic resists. The micro-grated LC films prepared by this novel method offer new applications for liquid crystal as alignment layer within LC cells as well as preparation of optical anisotropic films.",

author = "Huang-Ming Chen and Chiu, {Chih Ho} and Kuo, {Hui Lung} and Chen, {Pin G.} and Wen, {Chun Hsiang} and Liu, {Yi Chun}",

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AU - Chen, Huang-Ming

AU - Chiu, Chih Ho

AU - Kuo, Hui Lung

AU - Chen, Pin G.

AU - Wen, Chun Hsiang

AU - Liu, Yi Chun

PY - 2006/12/1

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N2 - Polymerizable nematic liquid crystal (LC) was applied as resist for our newly developed nanoimprinting lithography process. The LC resist was self-aligned during imprinting process at very low impriting pressure, 1.5 bar and the patterned area was able to achieve 4×4 cm2. The optical anisotropic was verified through polarized optical microscopy (POM). The various thickness of LC resist was evaluated and compared alignment ability with polyimide, and isotropic resists. The micro-grated LC films prepared by this novel method offer new applications for liquid crystal as alignment layer within LC cells as well as preparation of optical anisotropic films.

AB - Polymerizable nematic liquid crystal (LC) was applied as resist for our newly developed nanoimprinting lithography process. The LC resist was self-aligned during imprinting process at very low impriting pressure, 1.5 bar and the patterned area was able to achieve 4×4 cm2. The optical anisotropic was verified through polarized optical microscopy (POM). The various thickness of LC resist was evaluated and compared alignment ability with polyimide, and isotropic resists. The micro-grated LC films prepared by this novel method offer new applications for liquid crystal as alignment layer within LC cells as well as preparation of optical anisotropic films.

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T2 - 44th International Symposium, Seminar, and Exhibition, SID 2006

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Nanoimprinting lithography as novel tool inducing self-aligned liquid crystals for alignment layer

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