N+ -doped-layer-free microcrystalline silicon thin film transistors fabricated with the CuMg as source/drain metal

M. C. Wang*, T. C. Chang, Po-Tsun Liu, R. W. Xiao, L. F. Lin, Y. Y. Li, F. S. Yeh, J. R. Chen

*Corresponding author for this work

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Engineering

Material Science