MULTIPHOTON IONIZATION MASS SPECTROMETRY AS A MECHANISTIC PROBE OF CHEMICAL VAPOR DEPOSITION.

D. W. Squire; C. S. Dulcey; Ming-Chang Lin

doi:10.2351/1.5059594

MULTIPHOTON IONIZATION MASS SPECTROMETRY AS A MECHANISTIC PROBE OF CHEMICAL VAPOR DEPOSITION.

D. W. Squire^*, C. S. Dulcey, Ming-Chang Lin

^*Corresponding author for this work

Department of Applied Chemistry

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

3 Scopus citations

Abstract

The low pressure pyrolysis of alkylmetals on conducting, semiconducting and non-conducting surfaces was studied using multiphoton and electron ionization analysis. No products of surface radical recombination (such as CH//4 and C//2H//6) could be seen under the conditions employed. The activation energy for gas phase methyl radical production is 30 kcal/mol for trimethylgallium compared with 13 plus or minus 2 kcal/mol observed for trimethylaluminum decomposition. A deposition mechanism is proposed.

Original language	English
Title of host publication	LIA (Laser Institute of America)
Publisher	Laser Inst of America
Pages	148-151
Number of pages	4
ISBN (Print)	0912035293
DOIs	https://doi.org/10.2351/1.5059594
State	Published - 1 Dec 1985

Publication series

Name	LIA (Laser Institute of America)
Volume	49

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10.2351/1.5059594

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title = "MULTIPHOTON IONIZATION MASS SPECTROMETRY AS A MECHANISTIC PROBE OF CHEMICAL VAPOR DEPOSITION.",

abstract = "The low pressure pyrolysis of alkylmetals on conducting, semiconducting and non-conducting surfaces was studied using multiphoton and electron ionization analysis. No products of surface radical recombination (such as CH//4 and C//2H//6) could be seen under the conditions employed. The activation energy for gas phase methyl radical production is 30 kcal/mol for trimethylgallium compared with 13 plus or minus 2 kcal/mol observed for trimethylaluminum decomposition. A deposition mechanism is proposed.",

author = "Squire, {D. W.} and Dulcey, {C. S.} and Ming-Chang Lin",

year = "1985",

month = dec,

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doi = "10.2351/1.5059594",

language = "English",

isbn = "0912035293",

series = "LIA (Laser Institute of America)",

publisher = "Laser Inst of America",

pages = "148--151",

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AU - Squire, D. W.

AU - Dulcey, C. S.

AU - Lin, Ming-Chang

PY - 1985/12/1

Y1 - 1985/12/1

N2 - The low pressure pyrolysis of alkylmetals on conducting, semiconducting and non-conducting surfaces was studied using multiphoton and electron ionization analysis. No products of surface radical recombination (such as CH//4 and C//2H//6) could be seen under the conditions employed. The activation energy for gas phase methyl radical production is 30 kcal/mol for trimethylgallium compared with 13 plus or minus 2 kcal/mol observed for trimethylaluminum decomposition. A deposition mechanism is proposed.

AB - The low pressure pyrolysis of alkylmetals on conducting, semiconducting and non-conducting surfaces was studied using multiphoton and electron ionization analysis. No products of surface radical recombination (such as CH//4 and C//2H//6) could be seen under the conditions employed. The activation energy for gas phase methyl radical production is 30 kcal/mol for trimethylgallium compared with 13 plus or minus 2 kcal/mol observed for trimethylaluminum decomposition. A deposition mechanism is proposed.

UR - http://www.scopus.com/inward/record.url?scp=0022299261&partnerID=8YFLogxK

U2 - 10.2351/1.5059594

DO - 10.2351/1.5059594

M3 - Conference contribution

AN - SCOPUS:0022299261

SN - 0912035293

T3 - LIA (Laser Institute of America)

SP - 148

EP - 151

BT - LIA (Laser Institute of America)

PB - Laser Inst of America

ER -

MULTIPHOTON IONIZATION MASS SPECTROMETRY AS A MECHANISTIC PROBE OF CHEMICAL VAPOR DEPOSITION.

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