MoS2/Si Heterojunction Device Stacked Utilizing an All-Transfer-Printing Method

Pin Ruei Huang*, Bo Yan Chen, Yi Chieh Huang, Po Cheng Kuo, Tsan-Wen Lu, Shih Yen Lin, Po Tsung Lee

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The all-transfer-printing processes are utilized to realize photodetectors composed of MoS2/Si heterojunction. Compared to traditional photolithography process, this proposed method can avoid photoresist residue and organic solvent. As a result, the photoresponsivity increases ∼ 30 times.

Original languageEnglish
Title of host publication16th Pacific Rim Conference on Lasers and Electro-Optics, CLEO-PR 2024
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9798350372076
DOIs
StatePublished - 2024
Event16th Pacific Rim Conference on Lasers and Electro-Optics, CLEO-PR 2024 - Incheon, Korea, Republic of
Duration: 4 Aug 20249 Aug 2024

Publication series

Name16th Pacific Rim Conference on Lasers and Electro-Optics, CLEO-PR 2024

Conference

Conference16th Pacific Rim Conference on Lasers and Electro-Optics, CLEO-PR 2024
Country/TerritoryKorea, Republic of
CityIncheon
Period4/08/249/08/24

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