Abstract
A wet etching process was employed to investigate the evolution of pyramids on the patterned sapphire substrate (PSS). It has been found that the PSS comprised a hexagonal pyramid covered with six facets {34̄17} when disk-shaped SiO 2 mask still remained. Three facets {11̄05} were exposed when mask was etched away. In this study, a continuous etching process was performed. It was found that another six facets {45̄130} and another three facets {11̄010} appeared on the bottom and the top of pyramid. Finally, when the etching time reached around 5 min, most of pyramids on the PSS disappeared.
Original language | English |
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Pages (from-to) | 72-75 |
Number of pages | 4 |
Journal | Materials Letters |
Volume | 118 |
DOIs | |
State | Published - 1 Mar 2014 |
Keywords
- Crystal structure
- Optical materials
- Patterned sapphire substrate
- Properties
- Surfaces
- Wet etching process