@inproceedings{225765f88e364e64b03bb53a089e56f2,
title = "Mix-and-match lithography technology on 6-in. wafers for nanofabrication",
abstract = "This work describes the mix-and-match lithography technology for 0.1 micrometer device fabrication including a resist patterning process using a G-line stepper and an e-beam lithography system on 6 inch wafers, device pattern layout and device fabrication. A high resolution positive type e-beam resist combined with a high throughput G-line stepper is found to be ideally suitable for fabricating a device with nanometer scale.",
author = "Shy, \{Shyi Long\} and Tien-Sheng Chao and Chu, \{C. H.\} and Lei, \{T. F.\} and Kazumitsu Nakamura and Loong, \{Wen An\} and Chang, \{C. Y.\}",
year = "1995",
month = dec,
day = "1",
doi = "10.1117/12.228194",
language = "English",
isbn = "0819419850",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
pages = "406--412",
editor = "Shelden, \{Gilbert V.\} and Wiley, \{James N.\}",
booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",
note = "15th Annual BACUS Symposium on Photomask Technology and Management ; Conference date: 20-09-1995 Through 22-09-1995",
}