Mix-and-match lithography processes for 0.1 μm MOS transistor device fabrication

Jen Yu Yew*, Lih Juann Chen, Kazumitsu Nakamura, Tien-Sheng Chao, Horng-Chih Lin

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations

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Keyphrases

Engineering

Material Science