Microwave and RTA annealing of phos-doped, strained Si(100) and (110) implanted with molecular Carbon ions

Michael I. Current, Yao Jen Lee, Yu Lun Lu, Ta Chun Cho, Tien-Sheng Chao, Hiroshi Onoda, Karuppanan Sekar, Nobuhiro Tokoro

Research output: Contribution to conferencePaperpeer-review

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Engineering & Materials Science