Metal-insulator-semiconductor type diode based on implanted β-Ga2O3 epilayers grown on sapphire substrate by metalorganic chemical vapor deposition

Ray Hua Horng*, Apoorva Sood, Siddharth Rana, Niall Tumity, Fu Gow Tarntair, Catherine Langpoklakpam, Hao Chung Kuo, Jitendra Pratap Singh

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

Conductive β-Ga2O3 epilayers grown on the sapphire substrate using metalorganic chemical vapor deposition (MOCVD) were studied by Si-ion implanted. A metal-insulator-semiconductor diode (MISD) was fabricated using undoped and Si implanted β-Ga2O3 epitaxial layer. The electrical and carrier transport properties of the different MISD with different distance between cathode and anode contact ranging from 10 to 200 μm is studied. The various parameters such as forward current density, reverse breakdown voltage and ideality factor of the diodes has been calculated from the current-voltage curve. A reverse breakdown voltage of about 1.1 kV was observed in case of anode-cathode distance of 200 μm.

Original languageEnglish
Article number100382
JournalMaterials Today Advances
Volume18
DOIs
StatePublished - Jun 2023

Keywords

  • Metal-insulator-semiconductor diode
  • Metalorganic chemical vapor deposition
  • β-GaO

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