Magnetic depth profiling Co/Cu multilayers to investigate magnetoresistance (invited)

J. Unguris; D. Tulchinsky; M. H. Kelley; J. A. Borchers; J. A. Dura; C. F. Majkrzak; Shih-ying Hsu; R. Loloee; W. P. Pratt; J. Bass

doi:10.1063/1.372796

Magnetic depth profiling Co/Cu multilayers to investigate magnetoresistance (invited)

J. Unguris^*, D. Tulchinsky, M. H. Kelley, J. A. Borchers, J. A. Dura, C. F. Majkrzak, Shih-ying Hsu, R. Loloee, W. P. Pratt, J. Bass

^*Corresponding author for this work

Department of Electrophysics

Research output: Contribution to journal › Conference article › peer-review

8 Scopus citations

Abstract

The magnetic microstructure responsible for the metastable high resistance state of weakly coupled, as-prepared [Co(6 nm)/Cu(6 nm)]₂₀ multilayers was analyzed using polarized neutron reflectivity and scanning electron microscopy with polarization analysis (SEMPA). This article focuses and expands on the SEMPA measurements. In multilayer structures such as these, SEMPA can be combined with ion milling to directly image the layer-by-layer magnetization and quantitatively depth profile the interlayer magnetic domain correlations. We found that in the as-prepared Co/Cu multilayer, the domains are about 1 μm in size and the magnetizations in adjacent layers are almost completely oppositely aligned. The relative magnetoresistance derived from this measured degree of anticorrelation is in agreement with the measured magnetoresistance.

Original language	English
Pages (from-to)	6639-6643
Number of pages	5
Journal	Journal of Applied Physics
Volume	87
Issue number	9 III
DOIs	https://doi.org/10.1063/1.372796
State	Published - 1 May 2000
Event	44th Annual Conference on Magnetism and Magnetic Materials - San Jose, CA, United States Duration: 15 Nov 1999 → 18 Nov 1999

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title = "Magnetic depth profiling Co/Cu multilayers to investigate magnetoresistance (invited)",

abstract = "The magnetic microstructure responsible for the metastable high resistance state of weakly coupled, as-prepared [Co(6 nm)/Cu(6 nm)]20 multilayers was analyzed using polarized neutron reflectivity and scanning electron microscopy with polarization analysis (SEMPA). This article focuses and expands on the SEMPA measurements. In multilayer structures such as these, SEMPA can be combined with ion milling to directly image the layer-by-layer magnetization and quantitatively depth profile the interlayer magnetic domain correlations. We found that in the as-prepared Co/Cu multilayer, the domains are about 1 μm in size and the magnetizations in adjacent layers are almost completely oppositely aligned. The relative magnetoresistance derived from this measured degree of anticorrelation is in agreement with the measured magnetoresistance.",

author = "J. Unguris and D. Tulchinsky and Kelley, {M. H.} and Borchers, {J. A.} and Dura, {J. A.} and Majkrzak, {C. F.} and Shih-ying Hsu and R. Loloee and Pratt, {W. P.} and J. Bass",

year = "2000",

month = may,

day = "1",

doi = "10.1063/1.372796",

language = "English",

volume = "87",

pages = "6639--6643",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "9 III",

note = "44th Annual Conference on Magnetism and Magnetic Materials ; Conference date: 15-11-1999 Through 18-11-1999",

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TY - JOUR

T1 - Magnetic depth profiling Co/Cu multilayers to investigate magnetoresistance (invited)

AU - Unguris, J.

AU - Tulchinsky, D.

AU - Kelley, M. H.

AU - Borchers, J. A.

AU - Dura, J. A.

AU - Majkrzak, C. F.

AU - Hsu, Shih-ying

AU - Loloee, R.

AU - Pratt, W. P.

AU - Bass, J.

PY - 2000/5/1

Y1 - 2000/5/1

N2 - The magnetic microstructure responsible for the metastable high resistance state of weakly coupled, as-prepared [Co(6 nm)/Cu(6 nm)]20 multilayers was analyzed using polarized neutron reflectivity and scanning electron microscopy with polarization analysis (SEMPA). This article focuses and expands on the SEMPA measurements. In multilayer structures such as these, SEMPA can be combined with ion milling to directly image the layer-by-layer magnetization and quantitatively depth profile the interlayer magnetic domain correlations. We found that in the as-prepared Co/Cu multilayer, the domains are about 1 μm in size and the magnetizations in adjacent layers are almost completely oppositely aligned. The relative magnetoresistance derived from this measured degree of anticorrelation is in agreement with the measured magnetoresistance.

AB - The magnetic microstructure responsible for the metastable high resistance state of weakly coupled, as-prepared [Co(6 nm)/Cu(6 nm)]20 multilayers was analyzed using polarized neutron reflectivity and scanning electron microscopy with polarization analysis (SEMPA). This article focuses and expands on the SEMPA measurements. In multilayer structures such as these, SEMPA can be combined with ion milling to directly image the layer-by-layer magnetization and quantitatively depth profile the interlayer magnetic domain correlations. We found that in the as-prepared Co/Cu multilayer, the domains are about 1 μm in size and the magnetizations in adjacent layers are almost completely oppositely aligned. The relative magnetoresistance derived from this measured degree of anticorrelation is in agreement with the measured magnetoresistance.

UR - http://www.scopus.com/inward/record.url?scp=4243098616&partnerID=8YFLogxK

U2 - 10.1063/1.372796

DO - 10.1063/1.372796

M3 - Conference article

AN - SCOPUS:4243098616

SN - 0021-8979

VL - 87

SP - 6639

EP - 6643

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 9 III

T2 - 44th Annual Conference on Magnetism and Magnetic Materials

Y2 - 15 November 1999 through 18 November 1999

ER -

Magnetic depth profiling Co/Cu multilayers to investigate magnetoresistance (invited)

Abstract

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