Abstract
A flexible thin-film transistor (TFT) was made by integrating a high-κ HfLaO gate dielectric and an amorphous-InGaZnO (a-IGZO) active layer on a polyimide substrate. This flexible HfLaO/a-IGZO TFT exhibits a low threshold voltage of 0.1 V, a small subthreshold swing of 0.18 V/dec, a high maximum saturation mobility of 22.1 cm2V • s, and an acceptable on/off current ratio of 2×105. The low threshold voltage and small subthreshold swing allow the device to operate at 1.5 V for low-power applications, which should enable significant future progress in energy efficiency.
| Original language | English |
|---|---|
| Article number | 5460931 |
| Pages (from-to) | 680-682 |
| Number of pages | 3 |
| Journal | Ieee Electron Device Letters |
| Volume | 31 |
| Issue number | 7 |
| DOIs | |
| State | Published - Jul 2010 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 7 Affordable and Clean Energy
Keywords
- Flexible thin-film transistors (TFTs)
- HfLaO
- InGaZnO (IGZO)
- high-κ
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