Low-temperature growth of polycrystalline Ge films on SiO2 substrate by HDPCVD

Ming Jui Yang*, Jiann Shieh, Shih Lu Hsu, Ing Jye Huang, Ching Chich Leu, Shih Wen Shen, Tiao Yuan Huang, Peer Lehnen, Chao-Hsin Chien

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

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