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Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications

  • H. L. Chen*
  • , Y. F. Chuang
  • , C. C. Lee
  • , C. I. Hsieh
  • , Fu-Hsiang Ko
  • , L. A. Wang
    • *Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

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