Abstract
Various bilayer structures consisting of metal and silicon were investigated as possible candidates for the optical recording medium. The silicon-on-metal bilayers offer tunability with a reasonable thickness of Si in the visible spectrum with a typical reflectivity less than 5%. Of the two possible writing processes, the low-power process of silicide formation has a threshold power of 30 mW for a Rh-Si bilayer which provides a reflectivity change in excess of 40%. The absence of raised rims around the written spots offers a smooth morphology that is compatible with encapsulation.
Original language | English |
---|---|
Pages (from-to) | 3777-3783 |
Number of pages | 7 |
Journal | Journal of Applied Physics |
Volume | 53 |
Issue number | 5 |
DOIs | |
State | Published - 1 Dec 1982 |