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Investigation on selectively etched SiGe and Si surface for Gate-All-Around CMOS devices fabrication

  • Wei Yuan Chang
  • , Chun Lin Chu
  • , Guang Li Luo*
  • , Yi Shuo Huang
  • , Chun Hsiung Lin
  • , Po Jung Sung
  • , Yao-Jen Lee
  • , Shih Hong Chen
  • , Bo Yuan Chen
  • , Wen Fa Wu*
  • , Wen Kuan Yeh
    • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

5 Scopus citations

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Material Science