Investigation on Latch-Up Path between I/O PMOS and Core PMOS in a 0.18-μm CMOS Process

Chun Cheng Chen, Ming-Dou Ker

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

8 Scopus citations

Abstract

This work studied the latch-up path between two PMOS devices powered by different supply voltages in a 0.18μm CMOS process. In IC field applications, such a non-typical latchup path between two PMOS devices was ever fired to cause unrecoverable failures. Through the silicon test chip, the latch-up path between I/O PMOS and core PMOS was investigated in details. The measurement results from the silicon chip with split test structures can be used to investigate the design rules on anode-to-cathode spacing and guard ring placement to prevent such PMOS-to-PMOS latch-up issue. In chip layout of IC products, the PMOS devices in different power domains shall be carefully checked to prevent the occurrence of such unexpected latch-up path.

Original languageEnglish
Title of host publication2019 IEEE International Reliability Physics Symposium, IRPS 2019
PublisherInstitute of Electrical and Electronics Engineers Inc.
Number of pages4
ISBN (Electronic)9781538695043
DOIs
StatePublished - 1 Apr 2019
Event2019 IEEE International Reliability Physics Symposium, IRPS 2019 - Monterey, United States
Duration: 31 Mar 20194 Apr 2019

Publication series

NameIEEE International Reliability Physics Symposium Proceedings
Volume2019-March
ISSN (Print)1541-7026

Conference

Conference2019 IEEE International Reliability Physics Symposium, IRPS 2019
Country/TerritoryUnited States
CityMonterey
Period31/03/194/04/19

Keywords

  • Design rule
  • Guard ring
  • Holding voltage
  • Latch-up

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