Investigation of NH3Plasma Nitridation on Hysteresis-Free Gate-All-Around Stacked Poly-Si Nanosheet Channel FeFETs

Dong Ru Hsieh, Chia Chin Lee, Zi Yang Hong, Tien Sheng Chao*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

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Engineering & Materials Science

Chemical Compounds