Abstract
This paper provides an analytical subthreshold model for trigate MOSFETs with thin buried oxide (BOX) for multithreshold (multi-Vth}) applications. This model shows a fairly good scalability in substrate bias and BOX thickness, which is crucial to the prediction of multi-Vth modulation through BOX. In addition, we demonstrate the application of our model in multi-Vth} device design for trigate GeOI p-MOSFETs with the body-effect coefficient (γ) over a wide range of design space efficiently examined. We have shown an enhanced multi-Vthmodulation behavior in trigate GeOI p-MOSFETs. Our study indicates that, for a given subthreshold swing and γ , the GeOI trigate p-MOSFET can possess a higher fin aspect ratio than the SOI counterpart.
Original language | English |
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Article number | 6982209 |
Pages (from-to) | 88-93 |
Number of pages | 6 |
Journal | IEEE Transactions on Electron Devices |
Volume | 62 |
Issue number | 1 |
DOIs | |
State | Published - 1 Jan 2015 |
Keywords
- GeOI
- SOI
- multi-Vth design
- multigate MOSFET
- subthreshold
- trigate MOSFET.