TY - GEN
T1 - Investigation of electrostatic integrity for ultra-thin-body GeOI MOSFET using analytical solution of poisson's equation
AU - Hu, Pi-Ho
AU - Wu, Yu Sheng
AU - Su, Pin
PY - 2008
Y1 - 2008
N2 - The electrostatic integrity for UTB GeOI MOSFET is examined comprehensively by using analytical solution of Poisson's equation verified with TCAD simulation. Our results indicate that UTB GeOI MOSFETs with the ratio of channel length (Lg) to channel thickness (Tch) around 5 can show comparable subthreshold swing to that of the SOI counterparts. The impact of buried oxide thickness (TBOX) and back-gate bias (V back-gate) on the electrostatic integrity of GeOI devices are also examined.
AB - The electrostatic integrity for UTB GeOI MOSFET is examined comprehensively by using analytical solution of Poisson's equation verified with TCAD simulation. Our results indicate that UTB GeOI MOSFETs with the ratio of channel length (Lg) to channel thickness (Tch) around 5 can show comparable subthreshold swing to that of the SOI counterparts. The impact of buried oxide thickness (TBOX) and back-gate bias (V back-gate) on the electrostatic integrity of GeOI devices are also examined.
UR - http://www.scopus.com/inward/record.url?scp=63249087173&partnerID=8YFLogxK
U2 - 10.1109/EDSSC.2008.4760684
DO - 10.1109/EDSSC.2008.4760684
M3 - Conference contribution
AN - SCOPUS:63249087173
SN - 9781424425396
T3 - 2008 IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC
BT - 2008 IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC
T2 - 2008 IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC
Y2 - 8 December 2008 through 10 December 2008
ER -