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Investigation of Crystal-Face-Resolved Gate Switching Instability in 4H-SiC UMOSFETs Enabled by a Source-Separated Single-Cell Structure

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Abstract

In this work, we demonstrate the crystal-face-resolved gate switching instability in 4H-SiC UMOSFET. By employing a source-separated single-cell (SSSC) structure, we are able to characterize GSI of each crystal face and revealing reliability discrepancies arising from variations in crystal orientation, interface quality, and process-induced sidewall asymmetry.

Original languageEnglish
Title of host publication2026 38th IEEE International Conference on Microelectronic Test Structures, ICMTS 2026 - Conference Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9798319530103
DOIs
StatePublished - 2026
Event38th IEEE International Conference on Microelectronic Test Structures, ICMTS 2026 - Matsue, Japan
Duration: 23 Mar 202626 Mar 2026

Publication series

NameIEEE International Conference on Microelectronic Test Structures
ISSN (Print)1071-9032
ISSN (Electronic)2158-1029

Conference

Conference38th IEEE International Conference on Microelectronic Test Structures, ICMTS 2026
Country/TerritoryJapan
CityMatsue
Period23/03/2626/03/26

Keywords

  • Gate Switching Instability
  • Silicon Carbide
  • UMOSFET

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