TY - JOUR
T1 - Introduction to the Special Issue on the 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and the 28th Symposium on Plasma Science for Materials (SPSM-28)
AU - Akatsuka, Hiroshi
AU - Wu, Jong-Shinn
AU - Teii, Kungen
AU - Takaki, Koichi
N1 - Publisher Copyright:
© 2016 IEEE.
PY - 2016/12
Y1 - 2016/12
N2 - The Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT) has been held every two to four years since 1997, promoting an Asia-Pacific essential networking to share most innovative research results in low-temperature plasma society, in Taiwan until APSPT-8, 2013. In the meantime, it first changed its venue to Nagasaki, Japan, from APSPT-9 in 2015, to further expand its international role in scientific community with industrial society. At the same time, it was jointly organized with the 28th Symposium on Plasma Science for Materials, which was originated as the International Symposium on Plasma Chemistry since 1987, cultivating the international interdisciplinary field in both basic plasma science and practical applications based on materials science.
AB - The Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT) has been held every two to four years since 1997, promoting an Asia-Pacific essential networking to share most innovative research results in low-temperature plasma society, in Taiwan until APSPT-8, 2013. In the meantime, it first changed its venue to Nagasaki, Japan, from APSPT-9 in 2015, to further expand its international role in scientific community with industrial society. At the same time, it was jointly organized with the 28th Symposium on Plasma Science for Materials, which was originated as the International Symposium on Plasma Chemistry since 1987, cultivating the international interdisciplinary field in both basic plasma science and practical applications based on materials science.
UR - http://www.scopus.com/inward/record.url?scp=84997712946&partnerID=8YFLogxK
U2 - 10.1109/TPS.2016.2630858
DO - 10.1109/TPS.2016.2630858
M3 - Review article
AN - SCOPUS:84997712946
SN - 0093-3813
VL - 44
SP - 3050
EP - 3051
JO - IEEE Transactions on Plasma Science
JF - IEEE Transactions on Plasma Science
IS - 12
M1 - 7756332
ER -