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Interfacial abruptness in Si/SiGe heteroepitaxy grown by ultrahigh vacuum chemical vapor deposition
Wen Chung Tsai*, Chun Yen Chang, Tz Guei Jung, Ting Chang Chang, Horng-Chih Lin, Liang Po Chen
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review