Interaction between chromium oxide and chromium silicide

A. Cros*, R. A. Pollak, King-Ning Tu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Scopus citations


We have used x-ray induced photoemission spectroscopy and Rutherford backscattering spectroscopy to study the chemical reaction between Cr 2O3 and CrSi2. We observed that upon annealing a Cr film on a Si substrate at 550°C to form CrSi2, the native chromium surface oxide will decompose while a film of SiO2 will form when the CrSi2 growth front reaches the Cr2O3.

Original languageEnglish
Pages (from-to)258-259
Number of pages2
JournalJournal of Applied Physics
Issue number1
StatePublished - 1 Dec 1983


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