@inproceedings{e5ae817de0b941e0b5f8bb1e91173bc8,
title = "Intelligent reticle modification enabled large-area metalens patterning",
abstract = "Dielectric metalenses realized by economic photolithography technology are vital to their mass deployment in optoelectronic applications. However, pattern fidelity has become a serious issue that degrades the device performance due to optical proximity effects. Here, we demonstrate an intelligent reticle modification system which modifies the sizes and shapes of designed patterns based on a neural-network U-net lithographic model to produce nanostructures with desired dimensions. We demonstrate 2mm-diameter visible metalenses with diffraction-limited focusing using DUV KrF 248 nm photolithography. This work bridges between the semiconductor process and lens-making industries to realize high-volume manufacturing of versatile metalens and metasurface products.",
keywords = "Critical dimension(CD), DUV photolithography, Intelligent proximity correction(IPC), Metalens, Optical proximity correction (OPC), U-Net",
author = "Chou, {Chun Yen} and Liu, {Hsueh Li} and Huang, {Lin Chia} and Wilson Guo and Pei-Chen Yu and Chang, {You Chia} and Yao-Wei Huang and Shieh, {Jia Min}",
note = "Publisher Copyright: {\textcopyright} 2023 SPIE.; Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XX 2023 ; Conference date: 20-08-2023 Through 21-08-2023",
year = "2023",
doi = "10.1117/12.2685760",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Balaji Panchapakesan and Andre-Jean Attias and Andre-Jean Attias and Wounjhang Park",
booktitle = "Nanoengineering",
address = "United States",
}