Intelligent Photolithography Corrections Using Dimensionality Reductions

Parag Parashar, Chandni Akbar, Tejender S. Rawat, Sparsh Pratik, Rajat Butola, Shih H. Chen, Yung Sung Chang, Sirapop Nuannimnoi, Albert S. Lin*

*Corresponding author for this work

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Keyphrases

Engineering

Material Science