Abstract
In the Letter new N2O buffer oxide was used to replace the conventional dry oxide for LOCOS isolation. This new structure can result in a shorter bird's, beak than the conventional structure without adding extra steps and inducing the defect in silicon substrate.
| Original language | English |
|---|---|
| Pages (from-to) | 323-324 |
| Number of pages | 2 |
| Journal | Electronics Letters |
| Volume | 31 |
| Issue number | 4 |
| DOIs | |
| State | Published - 16 Feb 1995 |
Keywords
- Oxidation
- Silicon