Abstract
In the Letter new N2O buffer oxide was used to replace the conventional dry oxide for LOCOS isolation. This new structure can result in a shorter bird's, beak than the conventional structure without adding extra steps and inducing the defect in silicon substrate.
Original language | English |
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Pages (from-to) | 323-324 |
Number of pages | 2 |
Journal | Electronics Letters |
Volume | 31 |
Issue number | 4 |
DOIs | |
State | Published - 16 Feb 1995 |
Keywords
- Oxidation
- Silicon