InGaZnO Ferroelectric Thin-Film Transistor Using HfO/AlO/AlN Hybrid Gate Dielectric Stack With Ultra-Large Memory Window

Min Lu Kao, Yan Kui Liang, Yuan Lin, You Chen Weng, Chang Fu Dee, Po Tsun Liu, Ching Ting Lee, Edward Yi Chang*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

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Engineering & Materials Science

Chemical Compounds