INFLUENCE OF SILICIDE FORMATION OF SHALLOW p-n JUNCTION CHARACTERISTICS.

C. Y. Ting^*, M. Wittmer, King-Ning Tu

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

Original language	English
Pages (from-to)	257-258
Number of pages	2
Journal	Electrochemical Society Extended Abstracts
Volume	82-2
State	Published - 1 Dec 1982

Cite this

@article{4d7ca7cf1a2e4ba4aa7726e50ea664f4,

title = "INFLUENCE OF SILICIDE FORMATION OF SHALLOW p-n JUNCTION CHARACTERISTICS.",

author = "Ting, {C. Y.} and M. Wittmer and King-Ning Tu",

year = "1982",

month = dec,

day = "1",

language = "English",

volume = "82-2",

pages = "257--258",

journal = "Electrochemical Society Extended Abstracts",

issn = "0160-4619",

}

TY - JOUR

T1 - INFLUENCE OF SILICIDE FORMATION OF SHALLOW p-n JUNCTION CHARACTERISTICS.

AU - Ting, C. Y.

AU - Wittmer, M.

AU - Tu, King-Ning

PY - 1982/12/1

Y1 - 1982/12/1

UR - http://www.scopus.com/inward/record.url?scp=0020248451&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0020248451

VL - 82-2

SP - 257

EP - 258

JO - Electrochemical Society Extended Abstracts

JF - Electrochemical Society Extended Abstracts

SN - 0160-4619

ER -