Inelastic electron dephasing scattering times in disordered metals

Juhn-Jong Lin*

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

10 Scopus citations

Abstract

We have studied and compared the inelastic electron dephasing scattering times in disordered metals with significantly different characteristics. Both the temperature dependence and electron elastic mean-free-path (l) dependence of the electron-phonon scattering times, τep, are determined from weak-localization studies. Our experimental results suggest that τep-1 to approximately T2 in numerous crystalline disordered dilute Ti1-xAlx, dilute Ti1-xSnx, Au50Pd50, and Ti73Al27 alloys. However, our results do not support a universal dependence of τep-1 on l among these various metals. Our observation of the T2-law is in disagreement with current theoretical concept for electron-phonon interaction in disordered metals. In addition, we have inferred the critical electron-electron scattering times, τEE, in a number of very low-diffusivity thick Sc, RuO2, and IrO2 films. We find that τEE-1 to approximately T and also that τEE-1 is independent of l. This observation is understood in terms of the current theory for inelastic electron-electron scattering in bulk metals near the mobility edge. Our results altogether establish a crossover of the inelastic electron dephasing from electron-phonon scattering to electron-electron scattering as the amounts of disorder greatly increase and the systems move significantly toward the Anderson transition.

Original languageEnglish
Pages (from-to)191-195
Number of pages5
JournalPhysica B: Condensed Matter
Volume279
Issue number1-3
DOIs
StatePublished - Apr 2000
EventThe 5th International Conference on Electrical Transport and Optical Properties of Inhomogeneous Media (ETOPIM5) - Kowloon Tong, Hong Kong
Duration: 21 Jun 199925 Jun 1999

Keywords

  • Dephasing times
  • Electron-phonon relaxation
  • Electron-electron relaxation
  • Disordered metals

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