In-situ studies of the crystallization of amorphous CoSi2 films

David A. Smith*, King-Ning Tu, B. Z. Weiss

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

8 Scopus citations


The crystallization of amorphous CoSi2 is an ideal phase transformation for in-situ studies. This system satisfies the assumptions underlying the Johnson-Mehl-Avrami analysis rather well and produces a microstructure which can be modelled realistically. The nucleation rate can be measured independently of the growth rate. The activation energy for growth is found to be 1.1 eV/atom and microstructural observations suggest that the interface between amorphous and crystalline material is likely to advance by a ledge mechanism.

Original languageEnglish
Pages (from-to)90-96
Number of pages7
Issue number1-2
StatePublished - 1 Jan 1989


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