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Improved plasma charging immunity in ultra-thin gate oxide with fluorine and nitrogen implantation
C. C. Chen*, Horng-Chih Lin, C. Y. Chang, C. C. Huang, Chao-Hsin Chien, T. H. Huang, M. S. Liang
*Corresponding author for this work
Research output: Contribution to conference › Paper › peer-review
1
Scopus
citations