Impact of time dependent dielectric breakdown and stress induced leakage current on the reliability of (Ba,Sr)TiO3 thin film capacitors for Gbit-scale DRAMs

Shintaro Yamamichi*, Akiko Yamamichi, Donggun Park, Chen-Ming Hu

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

2 Scopus citations

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Engineering & Materials Science

Chemical Compounds

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