Impact of Dual-Gate Configuration on the Endurance of Ferroelectric Thin-Film Transistors With Nanosheet Polycrystalline-Silicon Channel Film

William Cheng Yu Ma*, Chun Jung Su, Kuo Hsing Kao, Ta Chun Cho, Jing Qiang Guo, Cheng Jun Wu, Po Ying Wu, Jia Yuan Hung

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

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Material Science