I-line photolithographic metalenses enabled by distributed optical proximity correction with a deep-learning model

Wei Ping Liao, Hsueh Li Liu, Yu Fan Lin, Sheng Siang Su, Yu Teng Chen, Guan Bo Lin, Tsung Chieh Tseng, Tong Ke Lin, Chun Chi Chen, Wen Hsien Huang, Shih Wei Chen, Jia Min Shieh, Peichen Yu*, You Chia Chang

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

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Engineering

Earth and Planetary Sciences