Hybrid Bonding of Nanotwinned Copper/organic Dielectrics with Low Thermal Budget

Kai Cheng Shie, Pin Syuan He, Yu Hao Kuo, Jia Juen Ong, K. N. Tu, Benson Tzu Hung Lin, Chia Cheng Chang, Chih Chen

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

16 Scopus citations

Abstract

The temperature for hybrid bonding is favorably to be lower than 250 ć, and thus nanotwinned Cu (nt-Cu) and low curing temperature dielectrics were combined to achieve that. To facilitate the fabrication of highly (111)-oriented surface of nt-Cu, Cu first process was chosen. In contrast to damascene Cu process, Cu first process changed the sequences of dielectric coating and Cu electroplating processes. In this study, patterned nt-Cu was plated first, and then dielectric was added in the process before or after chemical mechanical planarization (CMP). Low-temperature polyimide (PI) and non-conductive paste (NCP) were used to conduct two kinds of processes of hybrid bonding. If PI was coated and partially cured on a patterned wafer before CMP, co-planarization of nt-Cu/PI should be done afterwards to fabricate Cu/PI structure. The Cu/PI hybrid bonding can be achieved at 200 ć for 30 min. If a patterned wafer was planarized firstly, NCP was dropped on the samples and bonding process can be carried out at 180 ć for 2 h. This process was denoted as Cu + NCP hybrid bonding. The above two methods of hybrid bonding could be achieved under 250 ć, and might be the solutions for hybrid bonding technology with low thermal budget.

Original languageEnglish
Title of host publicationProceedings - IEEE 71st Electronic Components and Technology Conference, ECTC 2021
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages432-437
Number of pages6
ISBN (Electronic)9780738145235
DOIs
StatePublished - 2021
Event71st IEEE Electronic Components and Technology Conference, ECTC 2021 - Virtual, Online, United States
Duration: 1 Jun 20214 Jul 2021

Publication series

NameProceedings - Electronic Components and Technology Conference
Volume2021-June
ISSN (Print)0569-5503

Conference

Conference71st IEEE Electronic Components and Technology Conference, ECTC 2021
Country/TerritoryUnited States
CityVirtual, Online
Period1/06/214/07/21

Keywords

  • Cu first process
  • Hybrid bonding
  • NCP
  • Nanotwinned Cu
  • No-flow underfilling
  • Organic dielectric
  • PI

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