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High-performance HfO2 gate dielectrics fluorinated by postdeposition CF4 plasma treatment
Woei Cherng Wu*, Chao Sung Lai, Jer Chyi Wang, Jian Hao Chen, Ming Wen Ma, Tien-Sheng Chao
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
32
Scopus
citations