Keyphrases
Metal-organic Chemical Vapor Deposition (MOCVD)
100%
High Performance
100%
Low Power Consumption
100%
Epilayer
100%
High Temperature
100%
Deep UV Photodetectors
100%
ZnGa2O4
100%
Applied Bias
50%
Ultralow Dark Current
50%
Photo-to-dark Current Ratio
50%
Performance Improvement
25%
Temperature Effect
25%
Decay Time
25%
Temperature Range
25%
Ideality Factor
25%
Room Temperature
25%
Sapphire
25%
Low Power Operation
25%
Low Dark Current
25%
High Detectivity
25%
C-plane
25%
Wide Temperature Range
25%
Spinel
25%
Growth Time
25%
Emission Mechanism
25%
Deep UV
25%
Thermionic Emission
25%
Temperature Bias
25%
ZnGa2O4 Thin Film
25%
Dark Conditions
25%
UV Detection
25%
Ultrahigh Responsivity
25%
Engineering
Low Power Consumption
100%
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Photometer
100%
Temperature Range
50%
Current Ratio
50%
Thin Films
25%
Ideality Factor
25%
Room Temperature
25%
Responsivity
25%
Low Power Operation
25%
Decay Time
25%
Physics
Metalorganic Chemical Vapor Deposition
100%
Photometer
100%
Dark Current
100%
Thin Films
20%
Room Temperature
20%
Thermionic Emission
20%
Spinel
20%
Material Science
Chemical Vapor Deposition
100%
Epilayers
100%
Thin Films
50%
Sapphire
50%
Chemical Engineering
Metallorganic Chemical Vapor Deposition
100%
Film
50%